Vui lòng dùng định danh này để trích dẫn hoặc liên kết đến tài liệu này:
https://dspace.ctu.edu.vn/jspui/handle/123456789/12245
Nhan đề: | Atomic Heterointerfaces and Electrical Transportation Properties in Self-Assembled LaNiO3–NiO Heteroepitaxy |
Tác giả: | Zhu, Yuan Min Do, Thi Hien Tra, Vu Thanh Yu, Rong Chu, Ying-Hao Zhan, Qian |
Năm xuất bản: | 2018 |
Tùng thư/Số báo cáo: | Department of Materials Science and Engineering;p. 1-9 |
Tóm tắt: | Vertical nanostructure heteroepitaxy opens new opportunities for designing next-generation electronic devices due to the enthralling multifunction combi-nations and the abundant heterointerfaces manipulated effects. In this study, self-assembled heteroepitaxial thin flms, vertically aligned metallic LaNiO₃ (LNO) and semiconducting NiO with diverse heterointerfaces, are created and systematically investigated by advanced transmission electron microscopy. With the increase of LaNiO₃ content, the LaNiO3 phases present as isolated islands encircled by the connected NiO nanoplates and eventually become the continuous matrix with embedded NiO nanopillars. The atomic heterointer-face between NiO and LaNiO₃ phases is determined to be [NiO₂–LaO]LaNiO₃–LaO–[NiO]NiO, in which an extra La–O layer is enriched at the heterointerface. Besides, the formation mechanism of the heterointerface and antiphase boundaries observed in LaNiO₃ phase is discussed. The electrical transport properties at room temperature can be tuned gradually by changing the volume ratio of constituents. The correlation among the insulator-to-metal transition, the carrier types associated with transport behaviors, and the heterostructure evolutions are explored. This study offers a desirable platform to design new multifunctional electronic devices based on the oxide heterojunctions. |
Định danh: | http://dspace.ctu.edu.vn/jspui/handle/123456789/12245 |
Bộ sưu tập: | Tạp chí quốc tế |
Các tập tin trong tài liệu này:
Tập tin | Mô tả | Kích thước | Định dạng | |
---|---|---|---|---|
_file_ | 4.42 MB | Adobe PDF | Xem | |
Your IP: 18.227.105.110 |
Khi sử dụng các tài liệu trong Thư viện số phải tuân thủ Luật bản quyền.