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dc.contributor.authorKawamoto, Tomoya-
dc.contributor.authorPhạm, Văn Đan Thủy-
dc.contributor.authorFukao, Koji-
dc.contributor.authorNorisuye, Tomohisa-
dc.contributor.authorTran, Cong-Miyata Qui-
dc.contributor.authorNakanishi, Hideyuki-
dc.date.accessioned2018-11-20T03:41:51Z-
dc.date.available2018-11-20T03:41:51Z-
dc.date.issued2014-
dc.identifier.urihttp://localhost:8080//jspui/handle/123456789/5007-
dc.description.abstractMaterial processing using light at the microscopic scale has been widely exploited for designing specialty polymers. Photoresist, photolithography or photocalligraphy are among the popular technologies used for this purpose. From the viewpoint of polymer physics, depending on the experimental temperature, the photocured materials can undergo a liquid-to-glass transition via which the physical properties, such as glass transition temperature (Tց), and consequently the materials’ moduli can be greatly modified.vi_VN
dc.language.isoenvi_VN
dc.relation.ispartofseriesPolymer Journal;46 .- p.819-822-
dc.titleEffects of molecular weight on the local deformation of photo-cross-linked polymer blends studied by Macch-Zehnder interferometryvi_VN
dc.typeArticlevi_VN
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