Please use this identifier to cite or link to this item: https://dspace.ctu.edu.vn/jspui/handle/123456789/61904
Full metadata record
DC FieldValueLanguage
dc.contributor.authorDang, Thi Tuyet Ngan-
dc.contributor.authorTran, Trung Kien-
dc.contributor.authorWang, Da-Ming-
dc.date.accessioned2021-08-18T07:28:40Z-
dc.date.available2021-08-18T07:28:40Z-
dc.date.issued2021-
dc.identifier.issn2525-2518-
dc.identifier.urihttps://dspace.ctu.edu.vn/jspui/handle/123456789/61904-
dc.description.abstractSupported liquid membrane with strip dispersion (SLMSD) is a promising process for metal recovery from e-waste or waste streams because of many advantages such as the ability to combine extraction and stripping into one single step and thus have non-equilibrium mass transfer characteristics and maximum driving force. This paper investigated the effect of important factors on SLMSD performance to recover indium from etching solution such as: pH of feed solution, extractant (Di-(2-ethylhexyl) phosphoric acid (D2EHPA)) concentration, oxalic acid concentration. It was found that 99.5 % In3+ was removed from feed solution in about 20 minutes with high concentration factor (4.5) under suitable conditions (pH 1; 0.6M Di-(2ethylhexyl) phosphoric acid (D2EHPA), 2 wt% oxalic acid).vi_VN
dc.language.isoenvi_VN
dc.relation.ispartofseriesVietnam Journal of Science and Technology;Vol.59, No.01 .- P.90-95-
dc.subjectLiquid membranevi_VN
dc.subjectSLMSDvi_VN
dc.subjectIndium recoveryvi_VN
dc.subjectEtching solutionvi_VN
dc.subjectD2EHPAvi_VN
dc.titleSupported liquid membrane with strip dispersion for recovering indium from etching solution of LCD industry: Influence of factors on performancevi_VN
dc.typeArticlevi_VN
Appears in Collections:Vietnam journal of science and technology

Files in This Item:
File Description SizeFormat 
_file_
  Restricted Access
1.15 MBAdobe PDF
Your IP: 18.117.119.34


Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.